Advanced Ion PVD Process for Superior Diamond and Metal Coatings

The Radial Arc source is a breakthrough Physical Vapor Deposition (PVD) technology that provides fully ionized diamond and metal coatings deposition at high rates from a robust, practical deposition source. A novel compact filtered-cathodic-arc (FCA) geometry eliminates macroparticles without compromising deposition rate in a simple, high performance tool.  Tetrahedral amorphous carbon (ta-C “diamond”) films deposited using the Radial Arc source are high sp³ and many times harder than sputtered films. Metal compound films like titanium-nitride (TiN) offer extremely high adhesion, density, hardness and optimal stoichiometry.  The Radial Arc is a simple replacement for a magnetron or conventional arc source.

 

 

The Advantages of Ion Deposition:

· Full Ionization allows Precise Control of Deposition Energy and greater reactivity for Optimizing Your Film Properties such as adhesion, density, stoichiometry, hardness, and conformality.  For example: ion deposited diamond films are many times harder than sputtered diamond films and the stoichiometry of compound films (like TiN) is much better (and controllable) compared to less reactive processes like sputtering.

· Ionization allows Low  Deposition Temperatures.  Coat fragile substrates including plastics.

· Ionization for optimum performance in your application, including:  high sp³ tetrahedral amorphous carbon (ta-C “diamond”), electrically conductive diamond, semiconductor metallization, electronic, MEMS, optical, data storage, biomedical, surgical instrument, wear, corrosion, and decorative films.

· Optimum Quality metal, alloy, compound (nitrides, oxides, carbides), diamond, conductive diamond films.

A No-Compromise, Practical Deposition Tool:

The Radial Arc source is compact, symmetrical, easy to operate and maintain, and low cost. A Radial Arc source is $49k complete with source, power supply and automation.

·  A simple replacement for your magnetron or conventional arc source.  Now you can choose the most advanced thin films deposition technology without having to make compromises.

phone:  479.280.0036                           email:  info@fluxion-inc.com

The Radial Arc source in operation: a Carbon Plasma