Advanced Ion PVD Process for Superior Diamond and Metal Coatings
Diamond-Like-Carbon Films Unmatchable by Other Processes
Radial Arc carbon ion deposition allows precise control of deposition energy while maintaining low temperature, resulting in tetrahedral amorphous carbon films that can be 10 times harder than films deposited using non-ionized processes, such as sputtering. (see table below). Fluxion has also developed and industrialized the unique capability to deposit electrically conductive hard carbon films. Optimal diamond film properties, together with practical deposition rates uniform over large areas from an uncomplicated, compact source, will help you achieve your process goals.
Hard Carbon Comparison Data:
Image of the surface of a Radial Arc Hard Carbon film
phone: 360.369.4501 email: info@fluxion-inc.com
|
|
PVD (Sputtering) |
CVD (PECVD) |
ECR |
Ion Beam |
Filtered Cathodic-Arc RADIAL-ARC |
|
Coating Species |
Atoms |
Radicals |
Radicals |
Ions |
Ions |
|
Peak Energy |
~.1eV |
~1eV |
|
|
20 to 500eV |
|
SP3 Bond (%) |
0-30 |
|
25-40 |
30-50 |
80-88 |
|
Hardness (GPa) |
5-20 |
|
20-34 |
10-20 |
65-75 |
|
Youngs Modulus (GPa) |
~170 |
|
~250 |
~170 |
650-720 |
|
Density(g/cm3) |
1.7 – 2.2 |
3.2 - 3.4 |
2.1 - 2.5 |
1.7 - 2.3 |
3.3 - 3.5 |
|
Compressive Stress (GPa) |
~2 |
|
~4 – 10 |
~5 |
~2 - 3 |
|
Adhesion |
Moderate |
Good |
|
Fair |
Excellent |
|
Processing Temp. (°C) |
20-325 |
>600 |
|
|
20-180 |
|
Deposition Rate (Å/s) |
~10 |
|
~10 |
~20 |
Up to 20 |
|
Optical Band gap (eV) |
0-2.0 |
|
2.5-3.6 |
~2.5 |
2.1 - 2.5 controllable |
|
Infrared Transparency |
|
|
|
|
Excellent |
|
Corrosion Resistance |
Poor |
|
Good |
Good |
Excellent |
|
Resistivity (Ωcm) |
106 - 1012 |
|
1012 |
108 – 1012 |
~108 – 1010 conductive by doping |
|
Friction Coefficient |
~0.12 |
|
~0.12 |
~0.12 |
.08-.11 |
|
Structure |
Amorphous |
Crystalline |
|
|
Amorphous |
|
Cost |
Medium |
High |
Highest |
High |
Low |